Module 4 : Chemical and non–chemical approach to materials synthesis - part 2

Lecture 25 : Sputtering Processes for Thin Film Deposition

Magnetron Sputtering Principle

 

 

This technology uses powerful magnets to confine the “glow discharge” plasma to the region closest to the target plate. That vastly improves the deposition rate by maintaining a higher density of ions, which makes the electron/gas molecule collision process much more efficient.