Module 4 : Chemical and non–chemical approach to materials synthesis - part 2

Lecture 25 : Sputtering Processes for Thin Film Deposition

RF Sputtering

frequencies less than about 50 kHz

• electrons and ions in plasma are mobile

both follow the switching of the anode and cathode

• basically DC sputtering of both surfaces

frequencies above about 50 kHz

• ions (heavy) can no longer follow the switching

• enough electrons to ionize gases(5~30MHz)

Typically 13.56 MHz is used