Advantages of RF Sputtering
- It works well with insulating targets
- High efficiency
easier to keep plasma going → can operate at lower Ar pressures (1-15 mTorr) → fewer gas collisions → more line of sight deposition
Module 4 : Chemical and non–chemical approach to materials synthesis - part 2
Lecture 25 : Sputtering Processes for Thin Film Deposition
Advantages of RF Sputtering
easier to keep plasma going → can operate at lower Ar pressures (1-15 mTorr) → fewer gas collisions → more line of sight deposition