Parameters for Magnetron Sputtering
- Deposition pressure : 10-3 to 0.1 Pa ( 10-5 to 10-3 torr)
- Deposition rate : 0.2 ~ 2-6 m/min (10 times higher than conventional sputtering)
- Deposition temperature : 100 to 150°C
Module 4 : Chemical and non–chemical approach to materials synthesis - part 2
Lecture 25 : Sputtering Processes for Thin Film Deposition
Parameters for Magnetron Sputtering