Reactive Sputtering

Sputtering metallic target in the presence of a reactive gas mixed with inert gas (Ar)

• A mixture of inert +reactive gases used for sputtering

oxides – Al₂O₃, SiO₂, Ta₂O₅ (O₂)

nitrides – TaN, TiN, Si₃N₄ (N₂, NH₃)

carbides – TiC, WC, SiC (CH₄, C₂H₄, C₃H₈