Module 4 : Chemical and non–chemical approach to materials synthesis - part 2

Lecture 25 : Sputtering Processes for Thin Film Deposition

Light e-pulled towards walls faster than ions, leaving slightly more ions in glow region

Light e-move away from cathode faster than ions, leading to a large field, high acceleration of ions into cathode

high-E ions (10keV to 1 MeV) knock target material loose resulting plume of neutrals

new electrons from impact reactions replenish the plasma