METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS (MOSFETs)
  • If the inversion layer-substrate (or the source-substrate or the drain-substrate) junction ever gets forward bias, a large leakage current would result, which would hamper normal MOSFET operation.

  • For both n- and p-channel MOSFETs, the magnitude of the threshold voltage VT increases with an increase in |Vsub|.

Physical Understanding of Saturation
  • A physical insight into the phenomenon of saturation may be obtained by analyzing the electric field distribution under the gate.

  • Integrating Eq.(5.6) from 0 to x, one gets :

     
    or



  • The electric field in the channel in the direction parallel to the semiconductor-insulator interface can be found from Eq.(5.5)

    :

  • Solving Eqs.(5.12) and (5.13) together, the field profiles can be calculated.


    Fig.5.6 The variation of the electric field along the channel for drain voltage nearly equal to the saturation voltage for gate voltages


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