Module 3 : Fabrication Process and Layout Design Rules
Lecture 12 : CMOS Fabrication Technologies
 
12.4 N-well Technology (contd.)
We illustrate the fabrication steps involved in patterning silicon dioxide through optical lithography, using Figure 12.42 which shows the lithographic sequences.
 
image
image
Fig 12.42: Process steps required for patterning of silicon dioxide
 
 
 
 
 
 
 
 
 
 
 
 
 
 
back
6
next