The sputter yield depends on: (a) the energy of the incident ions; (b) the masses of the ions and target atoms; (c) the binding energy of atoms in the solid and (d) the incident angle of ions.
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Module 4 : Chemical and non–chemical approach to materials synthesis - part 2
Lecture 25 : Sputtering Processes for Thin Film Deposition
The sputter yield depends on: (a) the energy of the incident ions; (b) the masses of the ions and target atoms; (c) the binding energy of atoms in the solid and (d) the incident angle of ions.
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