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Module 3 : Fabrication Process and Layout Design Rules |
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Lecture 10 : General Aspects of CMOS Technology |
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Objectives |
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this course you will learn the following |
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Gate Material |
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Parasitic Capacitances |
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Self-aligned silicon gate technology |
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Channel Stopper |
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Polysilicon deposition |
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Oxide Growth |
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Active mask or Isolation mask (thin-ox) |
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