Module 3 : Fabrication Process and Layout Design Rules
Lecture 10 : General Aspects of CMOS Technology
 
   Recap
   In this lecture you have learnt the following
Gate Material
Parasitic Capacitances
Self-aligned silicon gate technology
Channel Stopper
Polysilicon deposition
Oxide Growth
Active mask or Isolation mask (thin-ox)
   
   
   
   
   
   
   
   
   
   
  Congratulations, you have finished Lecture 10. To view the next lecture select it from the left hand side menu of the page
 
 
 
 
 
 
 
 
 
 
 
 
 
 
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