| |
| Recap |
| In
this lecture you have learnt the following |
 |
Gate Material |
 |
Parasitic Capacitances |
 |
Self-aligned silicon gate technology |
 |
Channel Stopper |
 |
Polysilicon deposition |
 |
Oxide Growth |
 |
Active mask or Isolation mask (thin-ox) |
| |
|
| |
|
| |
|
| |
|
| |
|
| |
|
| |
|
| |
|
| |
|
| |
|
| |
Congratulations, you have finished Lecture 10. To view the next lecture select it from the left hand side menu of the page |
|
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |
|