Figure 40.3: Schematic diagrams of (a) a single and (b) modern electron optical column.

Figure 40.4: Illustration of the short-range (forward-scatter) and long-range (backscatter) interaction of electrons with resist-coated wafer.

Figure 40.3 shows the schematic diagrams of a simple e-beam column (a) and more complete column (b) of a EBL system. It consists of an electron source (or gun) at top, some probe forming optics, a beam blanker, a condenser lens to allow changes in the current and corresponding beam diameter, an objective lens to focus the beam on the wafer, and a deflector to scan the e-beam around.