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Microstereolithography: |
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This process is evolved from rapid prototyping process called stereolithography.The principle behind this process is whenever a photopolymer is exposed to light, it turns into solid. So selective exposure of liquid layer (photopolymer) to light is done.Using this complex 3-D structure is built layer by layer with one layer built on another. basically motivation behind using this are the limitations of traditional processes which are explained as below. |
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Limitations of traditional processes:
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Inability to manufacture high aspect ratio and complex 3D microstructures.
Conventional fabrication processes has capability to manufacture 2-D parts or planar components. |
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Limitation on materials processed
in conventional processes.using Microstereolithgraphy there is wider choice of materials such as Ceramics, Polymers, metal powder etc. |
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Types of Microstereolithographic Process : |
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Scanning Type : |
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After dividing 3-D structure into planar layers, each layer/section is scanned by Light (LASER) line by line. Figure 38.1 here the entire section is not exposed to light at a time.. |
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Dynamic Mask Type : |
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After dividing 3-D structure into planar layers, each layer/section is exposed to light at a time. Here is a mask which changes its shape dynamically. So after exposing one entire layer to light, mask changes its size & next entire section is exposed to light. To explain how the shape of mask changes, we will go in detail but later on. |
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Microstereolithography (Scan Type) : |
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