Mobility parameters
Specifically for Si,
N = dopant concentration i.e at room temperature
are determined experimentally
Parameters for Si:
|
|
|
|
1358 |
461 |
|
1352 |
459 |
|
1345 |
458 |
|
1298 |
448 |
|
1248 |
437 |
|
986 |
378 |
|
801 |
331 |
Parameters for GaAs:
|
|
|
|
|
0.4 |
1100 |
7100 |
0.542 |
|
0.8 |
200 |
8000 |
0.551 |
|
0.9 |
100 |
8100 |
0.594 |
|
Temperature Dependence
Again from experiment we find all have a temperature dependence of the form
For Si we have:
|
Electrons |
Holes |
|
N ref (cm -3 ) |
|
|
2.4 |
|
92 |
54.3 |
-0.57 |
|
1268 |
406.9 |
-2.33(electrons),-2.23(holes) |
|
0.91 |
0.88 |
0.146 |
GaAs behavior slightly different
High field effect
We know that drift velocity
But linear proportionality is valid only at low temperatures.
For E field intensity and E are no longer directly proportional. Nonlinear behavior is seen.
Now geometry is often small (submicron) so even with 1 V across dimension,
So mobility concept may fail in such high field zones.
For very high E field saturates.
For Si at 300 K, for both electrons and holes.
Model,
For GaAs initially decreases with E after a critical field is 2 10 3 v/cm and then very slowly increases, In a region of high which can be considered as saturated velocity .
However, in GaAs for holes the velocity saturates and Independent of E field. The variation of the drift velocity with electric field for holes and electrons are shown in Fig 5.8 and 5.9
|