Chapter 15: Mobility parameters

Mobility parameters

Specifically for Si,

N = dopant concentration i.e at room temperature

are determined experimentally

Parameters for Si:

1358

461

1352

459

1345

458

1298

448

1248

437

986

378

801

331

Parameters for GaAs:

0.4

1100

7100

0.542

0.8

200

8000

0.551

0.9

100

8100

0.594

Temperature Dependence

Again from experiment we find  all have a temperature dependence of the form                                                                     

For Si we have:

 

Electrons

Holes

N ref (cm -3 )

2.4

92

54.3

-0.57

1268

406.9

-2.33(electrons),-2.23(holes)

0.91

0.88

0.146

GaAs behavior slightly different

High field effect

We know that drift velocity

But linear proportionality is valid only at low temperatures.

For E field intensity and E are no longer directly proportional. Nonlinear behavior is seen.

Now geometry is often small (submicron) so even with 1 V across dimension,

 

So mobility concept may fail in such high field zones.

For very high E field saturates.

For Si at 300 K, for both electrons and holes.

Model,

 

 

For GaAs initially decreases with E after a critical field is 2 10 3 v/cm and then very slowly increases, In a region of high which can be considered as saturated velocity .

However, in GaAs for holes the velocity saturates and Independent of E field. The variation of the drift velocity with electric field for holes and electrons are shown in Fig 5.8 and 5.9

Fig 5.8

 

 

Fig 5.9