Please note that the above reactions are typical examples and many a lternative CVD chemistries are also available.

Many materials that we wish to deposit have very low vapor pressures and thus are difficult to transport via gases. One solution is to chemically attach the metal (for example Ga, Al, Cu, etc...) to an organic compound that has a very high vapor pressure. Organic compounds often have very high vapor pressure (for example, alcohol has a strong odor). The organic-metal bond is very weak and can be broken via thermal means on wafer, depositing the metal with the high vapor pressure organic being pumped away. Care must be taken to insure little of the organic byproducts are incorporated. Carbon contamination and unintentional hydrogen incorporation are sometimes a problem. As the human body absorbs organic compounds very easily, the metal organics are very easily absorbed by humans. Once in the body, the weak metal-organic bond is easily broken, thus, poisoning the body with heavy metals that often cannot be easily removed by normal bodily functions.